Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

Qiang Xua; Yongpeng Zhao; Yang Liu; Qi Li; Qi Wang

doi:10.1140/epjd/e2013-30500-5

Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

Qiang Xua
, Yongpeng Zhao
, Yang Liu
, Qi Li
, Qi Wang

School of Astronautics

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe¹⁰⁺ 4d⁸-4d⁷5p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.

Original language	English
Article number	125
Journal	European Physical Journal D
Volume	67
Issue number	6
DOIs	https://doi.org/10.1140/epjd/e2013-30500-5
State	Published - Jun 2013

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title = "Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge",

abstract = "The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe10+ 4d8-4d75p 13.5 nm in 2\% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.",

author = "Qiang Xua and Yongpeng Zhao and Yang Liu and Qi Li and Qi Wang",

year = "2013",

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language = "英语",

volume = "67",

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T1 - Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

AU - Xua, Qiang

AU - Zhao, Yongpeng

AU - Liu, Yang

AU - Li, Qi

AU - Wang, Qi

PY - 2013/6

Y1 - 2013/6

N2 - The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe10+ 4d8-4d75p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.

AB - The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe10+ 4d8-4d75p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.

UR - https://www.scopus.com/pages/publications/84880273699

U2 - 10.1140/epjd/e2013-30500-5

DO - 10.1140/epjd/e2013-30500-5

M3 - 文章

AN - SCOPUS:84880273699

SN - 1434-6060

VL - 67

JO - European Physical Journal D

JF - European Physical Journal D

IS - 6

M1 - 125

ER -

Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

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