Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage

E. A. Bogdanov; C. A. DeJoseph; V. I. Demidov; A. A. Kudryavtsev

doi:10.1063/1.2220005

Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage

E. A. Bogdanov^*
, C. A. DeJoseph
, V. I. Demidov
, A. A. Kudryavtsev

^*Corresponding author for this work

St. Petersburg State University
Air Force Research Laboratory
UES, Inc.

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

Original language	English
Article number	021501
Journal	Applied Physics Letters
Volume	89
Issue number	2
DOIs	https://doi.org/10.1063/1.2220005
State	Published - 2006
Externally published	Yes

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10.1063/1.2220005

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@article{d4a99cdd00dc4fd781b86be8c7f05c3c,

title = "Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage",

abstract = "It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.",

author = "Bogdanov, \{E. A.\} and DeJoseph, \{C. A.\} and Demidov, \{V. I.\} and Kudryavtsev, \{A. A.\}",

year = "2006",

doi = "10.1063/1.2220005",

language = "英语",

volume = "89",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "2",

}

TY - JOUR

T1 - Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage

AU - Bogdanov, E. A.

AU - DeJoseph, C. A.

AU - Demidov, V. I.

AU - Kudryavtsev, A. A.

PY - 2006

Y1 - 2006

N2 - It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

AB - It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

UR - https://www.scopus.com/pages/publications/33746062428

U2 - 10.1063/1.2220005

DO - 10.1063/1.2220005

M3 - 文章

AN - SCOPUS:33746062428

SN - 0003-6951

VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

M1 - 021501

ER -

Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage

Abstract

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