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Effect of bonding duration and substrate temperature in copper ball bonding on aluminium pads: A TEM study of interfacial evolution

  • H. Xu*
  • , C. Liu
  • , V. V. Silberschmidt
  • , Z. Chen
  • , J. Wei
  • , M. Sivakumar
  • *Corresponding author for this work
  • Loughborough University
  • Nanyang Technological University
  • Agency for Science, Technology and Research, Singapore
  • ASM Technology Singapore Pte. Ltd.

Research output: Contribution to journalArticlepeer-review

Abstract

The effect of bonding duration and substrate temperature on the nano-scale interfacial structure for bonding strength were investigated using high resolution transmission electron microscopy. It shows that intermetallic compound crystallization correlates with bonding duration, as a longer duration is applied, alumina fragmentation becomes pervasive, resulting in continuous alloy interfaces and robust bonds. In addition, a substrate temperature (i.e. 175 °C) promotes the fracture of alumina, and simultaneously contributes to the interfacial temperature, accelerating interdiffusion and facilitating the formation of intermetallic compounds, therefore increasing bonding strength. The compound formed during bonding is CuAl2, regardless of the bonding parameters applied.

Original languageEnglish
Pages (from-to)113-118
Number of pages6
JournalMicroelectronics Reliability
Volume51
Issue number1
DOIs
StatePublished - Jan 2011
Externally publishedYes

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