Effect of annealing temperature on the microstructure and mechanical properties of Ni-Mn-Ga-Gd thin film

Jian Yao; Xiao Hang Zheng; Wei Cai; Jiehe Sui

doi:10.1016/j.jallcom.2016.10.252

Effect of annealing temperature on the microstructure and mechanical properties of Ni-Mn-Ga-Gd thin film

Jian Yao
, Xiao Hang Zheng
, Wei Cai^*
, Jiehe Sui

^*Corresponding author for this work

School of Materials Science and Engineering

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

The influence of rapid thermal annealing temperature on the microstructure, martensitic transformation and mechanical properties of Ni_55.2Mn_24.7Ga_19.9Gd_0.2 thin films was investigated. It was shown that as-deposited film displayed a coexistence of amorphous and austenite nano-crystals. When the annealing temperature was above 450 °C, Ni_55.2Mn_24.7Ga_19.9Gd_0.2 thin films possessed seven-layered modulated martensite structure. With annealing temperature increased from 450 °C to 750 °C, the average grain size of annealed films increased from 126 to 596 nm and the transformation temperature also increased gradually. Fracture strain of 6.1% and tensile strength of 636 MPa were obtained for the Ni_55.2Mn_24.7Ga_19.9Gd_0.2 thin film annealed at 550 °C.

Original language	English
Pages (from-to)	1243-1247
Number of pages	5
Journal	Journal of Alloys and Compounds
Volume	695
DOIs	https://doi.org/10.1016/j.jallcom.2016.10.252
State	Published - 25 Feb 2017

Keywords

Martensitic transformation
Mechanical properties
Nanostructured materials
Shape memory alloys
Sputtering deposition

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10.1016/j.jallcom.2016.10.252

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@article{c168c08c9b72470d9f8b994704fc61ac,

title = "Effect of annealing temperature on the microstructure and mechanical properties of Ni-Mn-Ga-Gd thin film",

abstract = "The influence of rapid thermal annealing temperature on the microstructure, martensitic transformation and mechanical properties of Ni55.2Mn24.7Ga19.9Gd0.2 thin films was investigated. It was shown that as-deposited film displayed a coexistence of amorphous and austenite nano-crystals. When the annealing temperature was above 450 °C, Ni55.2Mn24.7Ga19.9Gd0.2 thin films possessed seven-layered modulated martensite structure. With annealing temperature increased from 450 °C to 750 °C, the average grain size of annealed films increased from 126 to 596 nm and the transformation temperature also increased gradually. Fracture strain of 6.1\% and tensile strength of 636 MPa were obtained for the Ni55.2Mn24.7Ga19.9Gd0.2 thin film annealed at 550 °C.",

keywords = "Martensitic transformation, Mechanical properties, Nanostructured materials, Shape memory alloys, Sputtering deposition",

author = "Jian Yao and Zheng, \{Xiao Hang\} and Wei Cai and Jiehe Sui",

note = "Publisher Copyright: {\textcopyright} 2016 Elsevier B.V.",

year = "2017",

month = feb,

day = "25",

doi = "10.1016/j.jallcom.2016.10.252",

language = "英语",

volume = "695",

pages = "1243--1247",

journal = "Journal of Alloys and Compounds",

issn = "0925-8388",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Effect of annealing temperature on the microstructure and mechanical properties of Ni-Mn-Ga-Gd thin film

AU - Yao, Jian

AU - Zheng, Xiao Hang

AU - Cai, Wei

AU - Sui, Jiehe

PY - 2017/2/25

Y1 - 2017/2/25

N2 - The influence of rapid thermal annealing temperature on the microstructure, martensitic transformation and mechanical properties of Ni55.2Mn24.7Ga19.9Gd0.2 thin films was investigated. It was shown that as-deposited film displayed a coexistence of amorphous and austenite nano-crystals. When the annealing temperature was above 450 °C, Ni55.2Mn24.7Ga19.9Gd0.2 thin films possessed seven-layered modulated martensite structure. With annealing temperature increased from 450 °C to 750 °C, the average grain size of annealed films increased from 126 to 596 nm and the transformation temperature also increased gradually. Fracture strain of 6.1% and tensile strength of 636 MPa were obtained for the Ni55.2Mn24.7Ga19.9Gd0.2 thin film annealed at 550 °C.

AB - The influence of rapid thermal annealing temperature on the microstructure, martensitic transformation and mechanical properties of Ni55.2Mn24.7Ga19.9Gd0.2 thin films was investigated. It was shown that as-deposited film displayed a coexistence of amorphous and austenite nano-crystals. When the annealing temperature was above 450 °C, Ni55.2Mn24.7Ga19.9Gd0.2 thin films possessed seven-layered modulated martensite structure. With annealing temperature increased from 450 °C to 750 °C, the average grain size of annealed films increased from 126 to 596 nm and the transformation temperature also increased gradually. Fracture strain of 6.1% and tensile strength of 636 MPa were obtained for the Ni55.2Mn24.7Ga19.9Gd0.2 thin film annealed at 550 °C.

KW - Martensitic transformation

KW - Mechanical properties

KW - Nanostructured materials

KW - Shape memory alloys

KW - Sputtering deposition

UR - https://www.scopus.com/pages/publications/85006110855

U2 - 10.1016/j.jallcom.2016.10.252

DO - 10.1016/j.jallcom.2016.10.252

M3 - 文章

AN - SCOPUS:85006110855

SN - 0925-8388

VL - 695

SP - 1243

EP - 1247

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

ER -

Effect of annealing temperature on the microstructure and mechanical properties of Ni-Mn-Ga-Gd thin film

Abstract

Keywords

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