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Effect of 3-amino-5-mercapto-l,2,4-triazole on electroless nickel deposition

  • Hai Ping Liu
  • , Ning Li*
  • , Si Fu Bi
  • , De Yu Li
  • , Zhong Li Zou
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

The effects of organic additive, 3-amino-5-mercaptoI, 2,4-triazole (AMTA) on bath stability, deposition rate, reaction activation energy, and Ni-P coating composition in acidic electroless nickel plating were investigated.Polarization curve method and infrared reflection spectroscopy were used to analyze the mechanism of the effect of AMTA on electroless nickel deposition. It was observed that AMTA improved bath stability, decreased the deposition rate, and increased the reaction activation energy. It was also revealed that AMTA decreased the phosphonrs content and increased the sulfur content in Ni-P coating. In addition, AMTA inhibited the anodic oxidation of hypophosphite and accelerated the cathodic reduction of Ni2+ Infrared reflection spectroscopy result indicates that AMTA was adsorbed on the surface of Ni-P and interacted with Ni2+ to form an AMTA-Ni2+ compound. On the basis of the results of this study, the mechanism of the effect of AMTA on electroless nickel deposition was deduced.

Original languageEnglish
Pages (from-to)101-105
Number of pages5
JournalChemical Research in Chinese Universities
Volume24
Issue number1
DOIs
StatePublished - Jan 2008

Keywords

  • Adsorption
  • Deposition rate
  • Ni-P electrode
  • Stabilizer

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