Direction-identical scratching method for fabricating nanostructures using a modified AFM nanoscratching system

To machine nanostructures with consistent depth and quality, a novel direction-identical scratching method based on a modified atomic force microscopy (AFM) probe-based machining system is proposed. During scratching, the optimized scratching direction is precisely maintained by rotating or/and moving the sample mounted on the stage of a modified AFM system. The specific procedures of this scratching method are described in detail and, compared to the conventional method, have the multiple advantages of optimized quality and consistent depth. Also, nanoline and nanochannel patterns are machined using this direction-identical scratching method, which is proved to be highly efficient.