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Development of fluorine induced plasma activating room-temperature bonding stratage for high-pressure micro-nano fluidic devices

  • Kihoon Jang*
  • , Chenxi Wang
  • , Yan Xu
  • , Takehiko Kitamori
  • *Corresponding author for this work
  • The University of Tokyo
  • Japan Science and Technology Agency
  • Nanoscience and Nanotechnology Research Center

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We developed room-temperature bonding of micro-nanofluidic device using fluorine induced plasma activation method. Fluorine was induced by O2 reactive ion etching (RIE) plasma treatment with Teflon Pieces which increased the bonding strength between fused silica glass substrates. The room-temperature bonded fused silica glass micro-nanofluidic device had high bonding strength as well as could work continuously without leakage during liquid introduction driven by air pressure even at 2000 kPa.

Original languageEnglish
Title of host publicationProceedings of the 16th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2012
PublisherChemical and Biological Microsystems Society
Pages1237-1239
Number of pages3
ISBN (Print)9780979806452
StatePublished - 2012
Externally publishedYes
Event16th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2012 - Okinawa, Japan
Duration: 28 Oct 20121 Nov 2012

Publication series

NameProceedings of the 16th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2012

Conference

Conference16th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2012
Country/TerritoryJapan
CityOkinawa
Period28/10/121/11/12

Keywords

  • Bonding strength
  • Fluorine induced plasma activation
  • Micro-nanofluidic device
  • Room-temperature bonding
  • Teflon pieces

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