Abstract
An integrated passive device technology by semi-insulating (SI)-GaAs-based fabrication has been developed to meet the ever-increasing needs of size and cost reduction in wireless applications. This technology includes reliable NiCr thin film resistor, high Q spiral inductor due to thick plated Cu/Au metal process to reduce resistive loss, high breakdown voltage metal-insulator-metal capacitor due to a thinner dielectric thickness, lowest parasitic effect by multi air-bridged metal layers, air-bridges for inductor underpass and capacitor pick-up, and low chip cost using only six process layers. This paper presents the Wilkinson power divider with excellent performance for a digital cellular system application. The insertion loss of this power divider is -0.53 dB and the port isolation greater than -30 dB over the entire band. Return loss in input and output ports are -20.2 dB and -35.8 dB, respectively. The Wilkinson power divider based on SI-GaAs substrates is designed within a die size of 1.42 mm 2 .
| Original language | English |
|---|---|
| Pages (from-to) | 322-327 |
| Number of pages | 6 |
| Journal | IETE Journal of Research |
| Volume | 58 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 2012 |
| Externally published | Yes |
Keywords
- Digital cellular system
- Integrated passive devices
- SI-GaAs substrate
- Wilkinson power divider
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