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Deposition of TiN layer on TiNi thin films to improve surface properties

  • Yongqing Fu*
  • , Hejun Du
  • , Sam Zhang
  • *Corresponding author for this work
  • Nanyang Technological University
  • Singapore-MIT Alliance

Research output: Contribution to journalArticlepeer-review

Abstract

TiNi based shape memory alloy (SMA) thin films have been widely used in biomedical and microelectromechanical systems. However, there are still some concerns for their wide applications because of their unsatisfactory mechanical and tribological performances, chemical resistance and biological reliability. This paper explored the deposition and effects of TiN protective layer on TiNi thin films to improve their surface properties while retaining the shape memory effects. Results indicated that the presence of an adherent and hard TiN layer (300 nm) on TiNi based SMA film (3.5 μm) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film.

Original languageEnglish
Pages (from-to)129-136
Number of pages8
JournalSurface and Coatings Technology
Volume167
Issue number2-3
DOIs
StatePublished - 22 Apr 2003
Externally publishedYes

Keywords

  • Shape memory
  • Sputtering
  • Thin films
  • TiN
  • TiNi

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