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Deposited carbon distributions on nickel film/oxide substrate systems

  • Masashi Yoshinaga*
  • , Haruo Kishimoto
  • , Katsuhiko Yamaji
  • , Yue Ping Xiong
  • , Manuel E. Brito
  • , Teruhisa Horita
  • , Harumi Yokokawa
  • *Corresponding author for this work
  • National Institute of Advanced Industrial Science and Technology
  • Tokyo City University

Research output: Contribution to journalArticlepeer-review

Abstract

Distribution of deposited carbon at early stage is investigated by micro-Raman spectroscopy. Model samples consisting of nickel films sputtered on oxide substrates were used. Carbon deposition treatment was carried out for three nickel/oxide systems: Ni/YSZ (Yttria Stabilized Zirconia), Ni/ScSZ (Scandia Stabilized Zirconia), and Ni/GDC (Gadolinia doped ceria) at 873 K under dry 4.9% CH4/Ar gas. Significant carbon deposition was observed on the nickel surfaces for both Ni/YSZ and Ni/ScSZ. No carbon was observed on the nickel surfaces of Ni/GDC system. According to Raman spectra, the deposited carbon bonding state was similar between Ni/YSZ and Ni/ScSZ systems and it correspond to a graphitic phase.

Original languageEnglish
Pages (from-to)571-575
Number of pages5
JournalSolid State Ionics
Volume192
Issue number1
DOIs
StatePublished - 16 Jun 2011
Externally publishedYes

Keywords

  • Anode
  • Carbon deposition
  • Gadolinia doped ceria (GDC)
  • Micro-Raman spectroscopy
  • Nickel based-cermet
  • SOFC
  • Scandia stabilized zirconia (ScSZ)
  • Yttria stabilized zirconia (YSZ)

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