Skip to main navigation Skip to search Skip to main content

Defect structure and optical damage resistance of In:Mg:Fe:LiNbO3 crystals with various Li/Nb ratios

  • Liang Sun*
  • , Jia Wang
  • , Qiang Lv
  • , Baoquan Liu
  • , Fengyun Guo
  • , Rui Wang
  • , Wei Cai
  • , Yuheng Xu
  • , Liancheng Zhao
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • Harbin Institute of Technology
  • Mudanjiang Medical University

Research output: Contribution to journalArticlepeer-review

Abstract

In:Mg:Fe:LiNbO3 crystals were grown by the Czochralski technique with various ratios of Li/Nb=0.85, 0.94, 1.05, 1.20 and 1.38 in the melt. The crystal composition and defect structure were analyzed by the UV-vis and IR spectroscopy. A new narrow OH--associated vibrational peak at 3518 cm-1 was revealed in In:Mg:Fe:LiNbO3 crystals with the ratio of Li/Nb=1.38. It was attributed to a (InNb)2--OH--(MgNb)3- defect center. The optical damage resistance of In:Mg:Fe:LiNbO3 crystals was studied by the transmitted beam pattern distortion method. The results show that when both the In2O3 threshold and the "In-Mg threshold" concentrations are reached, as for the Li/Nb ratio of 1.38, the optical damage resistance of In:Mg:Fe:LiNbO3 crystals is the highest.

Original languageEnglish
Pages (from-to)199-203
Number of pages5
JournalJournal of Crystal Growth
Volume297
Issue number1
DOIs
StatePublished - 15 Dec 2006
Externally publishedYes

Keywords

  • A2. Czochralski method
  • B1. Lithium compound
  • B2. Photo-refracitve materials

Fingerprint

Dive into the research topics of 'Defect structure and optical damage resistance of In:Mg:Fe:LiNbO3 crystals with various Li/Nb ratios'. Together they form a unique fingerprint.

Cite this