Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals

Hongxin Shi; Xiudong Sun; Suhua Luo; Yongyuan Jiang; Qingxin Meng

doi:10.1016/j.optlastec.2010.02.004

Defect structure and optical damage resistance of Hf:Fe:LiNbO₃ crystals

Hongxin Shi^*
, Xiudong Sun
, Suhua Luo
, Yongyuan Jiang
, Qingxin Meng

^*Corresponding author for this work

School of Physics

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

A series of Hf:Fe:LiNbO₃ crystals were grown by the Czochralski technique with various doping concentrations of HfO₂. Their defect structures were analyzed by the UV-visible absorption spectra and infrared absorption spectra. The optical damage resistance of Hf:Fe:LiNbO₃ crystals was measured by the photo-induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO₃ crystals enhances remarkably with the HfO₂ concentration increasing when the HfO₂ concentration is lower than its threshold concentration (4 mol%). However, when the HfO₂ concentration exceeds its threshold concentration, the optical damage resistance ability of the crystals returns to decrease. This unusual behavior is explained by using the photovoltaic field produced in the crystals. Crown

Original language	English
Pages (from-to)	1118-1121
Number of pages	4
Journal	Optics and Laser Technology
Volume	42
Issue number	7
DOIs	https://doi.org/10.1016/j.optlastec.2010.02.004
State	Published - Oct 2010

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

Defect structure
Optical damage resistance

Access to Document

10.1016/j.optlastec.2010.02.004

Cite this

@article{9093242b9dcb4b0ba842ced5162f22d1,

title = "Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals",

abstract = "A series of Hf:Fe:LiNbO3 crystals were grown by the Czochralski technique with various doping concentrations of HfO2. Their defect structures were analyzed by the UV-visible absorption spectra and infrared absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was measured by the photo-induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals enhances remarkably with the HfO2 concentration increasing when the HfO2 concentration is lower than its threshold concentration (4 mol\%). However, when the HfO2 concentration exceeds its threshold concentration, the optical damage resistance ability of the crystals returns to decrease. This unusual behavior is explained by using the photovoltaic field produced in the crystals. Crown",

keywords = "Defect structure, Optical damage resistance",

author = "Hongxin Shi and Xiudong Sun and Suhua Luo and Yongyuan Jiang and Qingxin Meng",

year = "2010",

month = oct,

doi = "10.1016/j.optlastec.2010.02.004",

language = "英语",

volume = "42",

pages = "1118--1121",

journal = "Optics and Laser Technology",

issn = "0030-3992",

publisher = "Elsevier Ltd",

number = "7",

}

TY - JOUR

T1 - Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals

AU - Shi, Hongxin

AU - Sun, Xiudong

AU - Luo, Suhua

AU - Jiang, Yongyuan

AU - Meng, Qingxin

PY - 2010/10

Y1 - 2010/10

N2 - A series of Hf:Fe:LiNbO3 crystals were grown by the Czochralski technique with various doping concentrations of HfO2. Their defect structures were analyzed by the UV-visible absorption spectra and infrared absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was measured by the photo-induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals enhances remarkably with the HfO2 concentration increasing when the HfO2 concentration is lower than its threshold concentration (4 mol%). However, when the HfO2 concentration exceeds its threshold concentration, the optical damage resistance ability of the crystals returns to decrease. This unusual behavior is explained by using the photovoltaic field produced in the crystals. Crown

AB - A series of Hf:Fe:LiNbO3 crystals were grown by the Czochralski technique with various doping concentrations of HfO2. Their defect structures were analyzed by the UV-visible absorption spectra and infrared absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was measured by the photo-induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals enhances remarkably with the HfO2 concentration increasing when the HfO2 concentration is lower than its threshold concentration (4 mol%). However, when the HfO2 concentration exceeds its threshold concentration, the optical damage resistance ability of the crystals returns to decrease. This unusual behavior is explained by using the photovoltaic field produced in the crystals. Crown

KW - Defect structure

KW - Optical damage resistance

UR - https://www.scopus.com/pages/publications/77950867013

U2 - 10.1016/j.optlastec.2010.02.004

DO - 10.1016/j.optlastec.2010.02.004

M3 - 文章

AN - SCOPUS:77950867013

SN - 0030-3992

VL - 42

SP - 1118

EP - 1121

JO - Optics and Laser Technology

JF - Optics and Laser Technology

IS - 7

ER -