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CVD growth of large–scale hexagon-like shaped MoSe2 monolayers with sawtooth edge

  • Xiaoshuang Chen*
  • , Ping An Hu
  • , Kun Song
  • , Xin Wang
  • , Chunling Zuo
  • , Rui Yang
  • , Jinping Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

In this work, we developed a process for preparing hexagon-like shaped MoSe2 monolayers with sawtooth edge via controllable chemical vapor deposition (CVD) technique in atmospheric pressure, resulting in large–scale MoSe2 atom layers with the size of ~20 μm and the height of ~0.8 nm. Raman, Photoluminescence (PL) and transmission electron microscopy (TEM) characterizations affirmed that the grown products possess high quality, and the electrical measurement results of the device with the mobility of 0.21 cm2 V−1 s−1 based on as-obtained products manifest that the underlying applications of MoSe2 in nanoelectronic field.

Original languageEnglish
Article number136663
JournalChemical Physics Letters
Volume733
DOIs
StatePublished - 16 Oct 2019

Keywords

  • Chemical vapor deposition
  • Field effect transistor
  • Hexagon-like
  • MoSe
  • Two-dimensional materials

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