Crystallization kinetics of NixTi1-x alloy thin films

Yongchao Lei; Hui Jie Zhao; Wei Cai; Xu An; Laixu Gao

doi:10.1016/j.physb.2009.10.024

Crystallization kinetics of Ni_xTi_1-x alloy thin films

Yongchao Lei
, Hui Jie Zhao
, Wei Cai^*
, Xu An
, Laixu Gao

^*Corresponding author for this work

Harbin Institute of Technology
Heilongjiang University

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The crystallization kinetics of Ni_xTi_1-x (x=53.5, 48.1, and 42.9) alloy thin films have been investigated by means of differential scanning calorimeter under nonisothermal conditions. The onset crystallization temperature T_x, crystallization peak temperature T_p and effective activation energy E_c of Ni_xTi_1-x alloy thin films are found to depend on the average heating rate and thin films composition during the continuous heating. The effective activation energy and the frequency factor are determined by the Kissinger method. The effects of composition and heating rate for NiTi thin films on crystallization have been discussed in view of the mobility of atom cluster.

Original language	English
Pages (from-to)	947-950
Number of pages	4
Journal	Physica B: Condensed Matter
Volume	405
Issue number	3
DOIs	https://doi.org/10.1016/j.physb.2009.10.024
State	Published - 1 Feb 2010
Externally published	Yes

Keywords

Amorphous thin films
Crystallization kinetics
Effects of heating rate
TiNi

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10.1016/j.physb.2009.10.024

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title = "Crystallization kinetics of NixTi1-x alloy thin films",

abstract = "The crystallization kinetics of NixTi1-x (x=53.5, 48.1, and 42.9) alloy thin films have been investigated by means of differential scanning calorimeter under nonisothermal conditions. The onset crystallization temperature Tx, crystallization peak temperature Tp and effective activation energy Ec of NixTi1-x alloy thin films are found to depend on the average heating rate and thin films composition during the continuous heating. The effective activation energy and the frequency factor are determined by the Kissinger method. The effects of composition and heating rate for NiTi thin films on crystallization have been discussed in view of the mobility of atom cluster.",

keywords = "Amorphous thin films, Crystallization kinetics, Effects of heating rate, TiNi",

author = "Yongchao Lei and Zhao, \{Hui Jie\} and Wei Cai and Xu An and Laixu Gao",

year = "2010",

month = feb,

day = "1",

doi = "10.1016/j.physb.2009.10.024",

language = "英语",

volume = "405",

pages = "947--950",

journal = "Physica B: Condensed Matter",

issn = "0921-4526",

publisher = "Elsevier B.V.",

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}

TY - JOUR

T1 - Crystallization kinetics of NixTi1-x alloy thin films

AU - Lei, Yongchao

AU - Zhao, Hui Jie

AU - Cai, Wei

AU - An, Xu

AU - Gao, Laixu

PY - 2010/2/1

Y1 - 2010/2/1

N2 - The crystallization kinetics of NixTi1-x (x=53.5, 48.1, and 42.9) alloy thin films have been investigated by means of differential scanning calorimeter under nonisothermal conditions. The onset crystallization temperature Tx, crystallization peak temperature Tp and effective activation energy Ec of NixTi1-x alloy thin films are found to depend on the average heating rate and thin films composition during the continuous heating. The effective activation energy and the frequency factor are determined by the Kissinger method. The effects of composition and heating rate for NiTi thin films on crystallization have been discussed in view of the mobility of atom cluster.

AB - The crystallization kinetics of NixTi1-x (x=53.5, 48.1, and 42.9) alloy thin films have been investigated by means of differential scanning calorimeter under nonisothermal conditions. The onset crystallization temperature Tx, crystallization peak temperature Tp and effective activation energy Ec of NixTi1-x alloy thin films are found to depend on the average heating rate and thin films composition during the continuous heating. The effective activation energy and the frequency factor are determined by the Kissinger method. The effects of composition and heating rate for NiTi thin films on crystallization have been discussed in view of the mobility of atom cluster.

KW - Amorphous thin films

KW - Crystallization kinetics

KW - Effects of heating rate

KW - TiNi

UR - https://www.scopus.com/pages/publications/72649096479

U2 - 10.1016/j.physb.2009.10.024

DO - 10.1016/j.physb.2009.10.024

M3 - 文章

AN - SCOPUS:72649096479

SN - 0921-4526

VL - 405

SP - 947

EP - 950

JO - Physica B: Condensed Matter

JF - Physica B: Condensed Matter

IS - 3

ER -

Crystallization kinetics of Ni_xTi_1-x alloy thin films

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Keywords

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