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Crystallization Behavior and Properties of B-Doped ZnO Thin Films Prepared by Sol-Gel Method with Different Pyrolysis Temperatures

  • Bin Wen
  • , Chao Qian Liu*
  • , Nan Wang
  • , Hua Lin Wang
  • , Shi Min Liu
  • , Wei Wei Jiang
  • , Wan Yu Ding
  • , Wei Dong Fei
  • , Wei Ping Chai
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Boron-doped zinc oxide transparent (BZO) films were prepared by sol-gel method. The effect of pyrolysis temperature on the crystallization behavior and properties was systematically investigated. XRD patterns revealed that the BZO films had wurtzite structure with a preferential growth orientation along the c-axis. With the increase of pyrolysis temperature, the particle size and surface roughness of the BZO films increased, suggesting that pyrolysis temperature is the critical factor for determining the crystallization behavior of the BZO films. Moreover, the carrier concentration and the carrier mobility increased with increasing the pyrolysis temperature, and the mean transmittance for every film is over 90% in the visible range.

Original languageEnglish
Pages (from-to)229-233
Number of pages5
JournalChinese Journal of Chemical Physics
Volume29
Issue number2
DOIs
StatePublished - 27 Apr 2016
Externally publishedYes

Keywords

  • Boron-doped ZnO
  • Pyrolysis temperature
  • Sol-gel
  • Thin film
  • Transparent conduction oxide

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