Concentration protile of etchant measured by microelectrode technique in the process of chemical micromachining

Jing Tang; Xin Zhou Ma; Hui Zhong He; Li Zhang; Mi Xuan Lin; Dong Sheng Qu; Qing Yong Ding; Li Ning Sun

Concentration protile of etchant measured by microelectrode technique in the process of chemical micromachining

Jing Tang^*
, Xin Zhou Ma
, Hui Zhong He
, Li Zhang
, Mi Xuan Lin
, Dong Sheng Qu
, Qing Yong Ding
, Li Ning Sun

^*Corresponding author for this work

School of Mechatronics Engineering

Xiamen University
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

A carbon-disk microelectrode was used to investigate the surface concentration profile of etchant Br₂, which was electrogenerated on the Pt working electrode. The steady state reducing currents of Br₂ at different distances away from the Pt electode was measured. The concentration profile was estimated from the current-distance variation curves as a function of different sampling times. Experimentally determined concentration profiles are in good agreement with those estimated from the microetching results. The microelectrode technique has offered a good method to choose suitable etching solution for chemical micromachining.

Original language	English
Pages (from-to)	507-512
Number of pages	6
Journal	Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica
Volume	22
Issue number	4
State	Published - Apr 2006

Keywords

Concentration profile
Confined etchant layer technique (CELT)
GaAs
L-cystine
Microelectrode

Cite this

@article{9a8e82ad200e49b2b223e9c446627615,

title = "Concentration protile of etchant measured by microelectrode technique in the process of chemical micromachining",

abstract = "A carbon-disk microelectrode was used to investigate the surface concentration profile of etchant Br2, which was electrogenerated on the Pt working electrode. The steady state reducing currents of Br2 at different distances away from the Pt electode was measured. The concentration profile was estimated from the current-distance variation curves as a function of different sampling times. Experimentally determined concentration profiles are in good agreement with those estimated from the microetching results. The microelectrode technique has offered a good method to choose suitable etching solution for chemical micromachining.",

keywords = "Concentration profile, Confined etchant layer technique (CELT), GaAs, L-cystine, Microelectrode",

author = "Jing Tang and Ma, \{Xin Zhou\} and He, \{Hui Zhong\} and Li Zhang and Lin, \{Mi Xuan\} and Qu, \{Dong Sheng\} and Ding, \{Qing Yong\} and Sun, \{Li Ning\}",

year = "2006",

month = apr,

language = "英语",

volume = "22",

pages = "507--512",

journal = "Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica",

issn = "1000-6818",

publisher = "Elsevier B.V.",

number = "4",

}

TY - JOUR

T1 - Concentration protile of etchant measured by microelectrode technique in the process of chemical micromachining

AU - Tang, Jing

AU - Ma, Xin Zhou

AU - He, Hui Zhong

AU - Zhang, Li

AU - Lin, Mi Xuan

AU - Qu, Dong Sheng

AU - Ding, Qing Yong

AU - Sun, Li Ning

PY - 2006/4

Y1 - 2006/4

N2 - A carbon-disk microelectrode was used to investigate the surface concentration profile of etchant Br2, which was electrogenerated on the Pt working electrode. The steady state reducing currents of Br2 at different distances away from the Pt electode was measured. The concentration profile was estimated from the current-distance variation curves as a function of different sampling times. Experimentally determined concentration profiles are in good agreement with those estimated from the microetching results. The microelectrode technique has offered a good method to choose suitable etching solution for chemical micromachining.

AB - A carbon-disk microelectrode was used to investigate the surface concentration profile of etchant Br2, which was electrogenerated on the Pt working electrode. The steady state reducing currents of Br2 at different distances away from the Pt electode was measured. The concentration profile was estimated from the current-distance variation curves as a function of different sampling times. Experimentally determined concentration profiles are in good agreement with those estimated from the microetching results. The microelectrode technique has offered a good method to choose suitable etching solution for chemical micromachining.

KW - Concentration profile

KW - Confined etchant layer technique (CELT)

KW - GaAs

KW - L-cystine

KW - Microelectrode

UR - https://www.scopus.com/pages/publications/33646238938

M3 - 文章

AN - SCOPUS:33646238938

SN - 1000-6818

VL - 22

SP - 507

EP - 512

JO - Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica

JF - Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica

IS - 4

ER -

Concentration protile of etchant measured by microelectrode technique in the process of chemical micromachining

Abstract

Keywords

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