Abstract
TiN films were prepared by two methods on the aluminium alloy. One method is plasma-based ion implantation of Ti and N, and another is N ion implantation into Ti film, which was deposited on aluminum alloy. The composition depth profiles and element chemical states of the TiN films were analyzed using XPS, and the nano-hardness of the TiN films was measured by mechanical properties microprobe. The results show that the films prepared by both methods were mainly composed of TiN, but the Ti/N ratio in both TiN films is different and they are 1.1 and 1.3 for plasma-based ion implantation and N ion implantation mixing film, respectively. The surface of the Ti and N plasma-based ion implantation film was composed of TiN and a little TiO2, however surface of N ion implantation mixing film was dominated by TiO2. The hardness of 12. 26 GPa for plasma-based ion implantation film is higher than that of 7.98 GPa for N ion implantation mixing film.
| Original language | English |
|---|---|
| Pages (from-to) | 40-43 |
| Number of pages | 4 |
| Journal | Cailiao Kexue yu Gongyi/Material Science and Technology |
| Volume | 15 |
| Issue number | 1 |
| State | Published - Feb 2007 |
| Externally published | Yes |
Keywords
- Composition depth profiles
- Element chemical state
- Nano-hardness
- Plasma-based ion implantation
- TiN film
- XPS
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