Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias

Guangze Tang; Xinxin Ma; Mingren Sun

doi:10.1016/j.diamond.2007.01.020

Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias

Guangze Tang
, Xinxin Ma^*
, Mingren Sun

^*Corresponding author for this work

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

By applying a negative high pulsed voltage to Si (111) substrates, ultra-thin fluorine carbon films of about 3 nm thick are deposited and completely covered on the samples by RF magnetron sputtering with PTFE target. Angle resolved X-ray photoelectron spectroscopy analysis indicates that the surface of the deposited films is rich in fluorine, and C-F₂, CF-CF and C-F groups in the outmost surface layer are much more than those in the inner layer of the films. The reason for this forming fluorine-rich phenomenon is explained and a two-layer model is proposed.

Original language	English
Pages (from-to)	1586-1588
Number of pages	3
Journal	Diamond and Related Materials
Volume	16
Issue number	8
DOIs	https://doi.org/10.1016/j.diamond.2007.01.020
State	Published - Aug 2007
Externally published	Yes

Keywords

Amorphous carbon
Nanotechnology
Physical vapor deposition
Surface characterization
Surface structure

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10.1016/j.diamond.2007.01.020

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title = "Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias",

abstract = "By applying a negative high pulsed voltage to Si (111) substrates, ultra-thin fluorine carbon films of about 3 nm thick are deposited and completely covered on the samples by RF magnetron sputtering with PTFE target. Angle resolved X-ray photoelectron spectroscopy analysis indicates that the surface of the deposited films is rich in fluorine, and C-F2, CF-CF and C-F groups in the outmost surface layer are much more than those in the inner layer of the films. The reason for this forming fluorine-rich phenomenon is explained and a two-layer model is proposed.",

keywords = "Amorphous carbon, Nanotechnology, Physical vapor deposition, Surface characterization, Surface structure",

author = "Guangze Tang and Xinxin Ma and Mingren Sun",

year = "2007",

month = aug,

doi = "10.1016/j.diamond.2007.01.020",

language = "英语",

volume = "16",

pages = "1586--1588",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier B.V.",

number = "8",

}

TY - JOUR

T1 - Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias

AU - Tang, Guangze

AU - Ma, Xinxin

AU - Sun, Mingren

PY - 2007/8

Y1 - 2007/8

N2 - By applying a negative high pulsed voltage to Si (111) substrates, ultra-thin fluorine carbon films of about 3 nm thick are deposited and completely covered on the samples by RF magnetron sputtering with PTFE target. Angle resolved X-ray photoelectron spectroscopy analysis indicates that the surface of the deposited films is rich in fluorine, and C-F2, CF-CF and C-F groups in the outmost surface layer are much more than those in the inner layer of the films. The reason for this forming fluorine-rich phenomenon is explained and a two-layer model is proposed.

AB - By applying a negative high pulsed voltage to Si (111) substrates, ultra-thin fluorine carbon films of about 3 nm thick are deposited and completely covered on the samples by RF magnetron sputtering with PTFE target. Angle resolved X-ray photoelectron spectroscopy analysis indicates that the surface of the deposited films is rich in fluorine, and C-F2, CF-CF and C-F groups in the outmost surface layer are much more than those in the inner layer of the films. The reason for this forming fluorine-rich phenomenon is explained and a two-layer model is proposed.

KW - Amorphous carbon

KW - Nanotechnology

KW - Physical vapor deposition

KW - Surface characterization

KW - Surface structure

UR - https://www.scopus.com/pages/publications/34249089835

U2 - 10.1016/j.diamond.2007.01.020

DO - 10.1016/j.diamond.2007.01.020

M3 - 文章

AN - SCOPUS:34249089835

SN - 0925-9635

VL - 16

SP - 1586

EP - 1588

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 8

ER -

Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias

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Keywords

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