Comparison of sulfamethoxazole and ciprofloxacin degradation by UV/H2O2 process

Hai Yan Yang; Yi Hua Chen; Jiu Min Jia; Bo Yang; Qiu Jin; Guan Dong Sun

doi:10.5004/dwt.2017.21336

Comparison of sulfamethoxazole and ciprofloxacin degradation by UV/H₂O₂ process

Hai Yan Yang
, Yi Hua Chen^*
, Jiu Min Jia
, Bo Yang
, Qiu Jin
, Guan Dong Sun

^*Corresponding author for this work

Beijing University of Civil Engineering and Architecture
China Construction Engineering Design Group Corporation Limited

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

The rate constants of sulfamethoxazole (SMX) and ciprofloxacin (CIP) degradation as well as the removal of total organic carbon (TOC) by UV/H₂O₂ process was investigated under various parameters including different H₂O₂ dosage and initial pH values. The results indicated that both SMX and CIP were efficiently removed in UV/H₂O₂ process and they peaked at different pH values of 3 and 7 respectively, while CIP degradation was greater than that of SMX. TOC removal was decreased with the pH values increased in the degradation of SMX in UV/H₂O₂ process while no significant change for CIP with the pH values raised. Based on molecular structure analysis, the transformation of both sulfonamide bond and oxazole ring N–O band in SMX were more difficult than defluorination and change of piperazine ring in CIP.

Original language	English
Pages (from-to)	158-164
Number of pages	7
Journal	Desalination and Water Treatment
Volume	86
DOIs	https://doi.org/10.5004/dwt.2017.21336
State	Published - Aug 2017
Externally published	Yes

Keywords

CIP
Degradation
Mineralization
SMX
UV/HO

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10.5004/dwt.2017.21336

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title = "Comparison of sulfamethoxazole and ciprofloxacin degradation by UV/H2O2 process",

abstract = "The rate constants of sulfamethoxazole (SMX) and ciprofloxacin (CIP) degradation as well as the removal of total organic carbon (TOC) by UV/H2O2 process was investigated under various parameters including different H2O2 dosage and initial pH values. The results indicated that both SMX and CIP were efficiently removed in UV/H2O2 process and they peaked at different pH values of 3 and 7 respectively, while CIP degradation was greater than that of SMX. TOC removal was decreased with the pH values increased in the degradation of SMX in UV/H2O2 process while no significant change for CIP with the pH values raised. Based on molecular structure analysis, the transformation of both sulfonamide bond and oxazole ring N–O band in SMX were more difficult than defluorination and change of piperazine ring in CIP.",

keywords = "CIP, Degradation, Mineralization, SMX, UV/HO",

author = "Yang, \{Hai Yan\} and Chen, \{Yi Hua\} and Jia, \{Jiu Min\} and Bo Yang and Qiu Jin and Sun, \{Guan Dong\}",

year = "2017",

month = aug,

doi = "10.5004/dwt.2017.21336",

language = "英语",

volume = "86",

pages = "158--164",

journal = "Desalination and Water Treatment",

issn = "1944-3994",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Comparison of sulfamethoxazole and ciprofloxacin degradation by UV/H2O2 process

AU - Yang, Hai Yan

AU - Chen, Yi Hua

AU - Jia, Jiu Min

AU - Yang, Bo

AU - Jin, Qiu

AU - Sun, Guan Dong

PY - 2017/8

Y1 - 2017/8

N2 - The rate constants of sulfamethoxazole (SMX) and ciprofloxacin (CIP) degradation as well as the removal of total organic carbon (TOC) by UV/H2O2 process was investigated under various parameters including different H2O2 dosage and initial pH values. The results indicated that both SMX and CIP were efficiently removed in UV/H2O2 process and they peaked at different pH values of 3 and 7 respectively, while CIP degradation was greater than that of SMX. TOC removal was decreased with the pH values increased in the degradation of SMX in UV/H2O2 process while no significant change for CIP with the pH values raised. Based on molecular structure analysis, the transformation of both sulfonamide bond and oxazole ring N–O band in SMX were more difficult than defluorination and change of piperazine ring in CIP.

AB - The rate constants of sulfamethoxazole (SMX) and ciprofloxacin (CIP) degradation as well as the removal of total organic carbon (TOC) by UV/H2O2 process was investigated under various parameters including different H2O2 dosage and initial pH values. The results indicated that both SMX and CIP were efficiently removed in UV/H2O2 process and they peaked at different pH values of 3 and 7 respectively, while CIP degradation was greater than that of SMX. TOC removal was decreased with the pH values increased in the degradation of SMX in UV/H2O2 process while no significant change for CIP with the pH values raised. Based on molecular structure analysis, the transformation of both sulfonamide bond and oxazole ring N–O band in SMX were more difficult than defluorination and change of piperazine ring in CIP.

KW - CIP

KW - Degradation

KW - Mineralization

KW - SMX

KW - UV/HO

UR - https://www.scopus.com/pages/publications/85032022553

U2 - 10.5004/dwt.2017.21336

DO - 10.5004/dwt.2017.21336

M3 - 文章

AN - SCOPUS:85032022553

SN - 1944-3994

VL - 86

SP - 158

EP - 164

JO - Desalination and Water Treatment

JF - Desalination and Water Treatment

ER -

Comparison of sulfamethoxazole and ciprofloxacin degradation by UV/H₂O₂ process

Abstract

Keywords

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