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Communication–A High-Efficiency and Low-Damage Treatment for Pressure Less Sintering of Ag Micro-Nano Particles at Low Temperature

  • Han Yan
  • , Xiaoyun Qi
  • , Chenxi Wang*
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Pressure-free and low-damage interconnections are essential for high-density packaging of high-power devices. Here, a novel and high-efficient plasma treatment method to sinter micro-nano particles at low temperature without pressure is discussed. The silver paste was exposed to Ar/H2 plasma for only 10 s, followed by sintering at 200 ℃ for 15 min. The shear strength increased to 2.6 times that of the untreated sample. Improvements in the sheet resistivity and thermal conductivity were observed. Ar/H2 plasma treatment is a viable approach for enhancing the sintering performance of commercially available silver pastes, thereby contributing to advancements in packaging technology.

Original languageEnglish
Article number14004
JournalECS Journal of Solid State Science and Technology
Volume14
Issue number1
DOIs
StatePublished - 2025

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