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Chromatic aberration-eliminated optical system of 3ωtarget alignment laser for SG-III prototype facility

  • Keyu Li
  • , Zhan Sui
  • , Huaiting Jia
  • , Bin Feng
  • , Yong Xiang
  • , Fuquan Li
  • , Chi Ma
  • , Xiaofeng Wei
  • China Academy of Engineering Physics

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

To realize multi-beam positions and crystals alignment, the 3ω target alignment laser of SG-III Prototype Facility has been designed as a reflection optical system, which avoids the effect of chromatic aberration.

Original languageEnglish
Title of host publicationInternational Optical Design Conference, IODC 2006
PublisherOptical Society of America
ISBN (Print)155752811X, 9781557528117
StatePublished - 2006
Externally publishedYes
EventInternational Optical Design Conference, IODC 2006 - Vancouver, Canada
Duration: 4 Jun 20064 Jun 2006

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceInternational Optical Design Conference, IODC 2006
Country/TerritoryCanada
CityVancouver
Period4/06/064/06/06

Keywords

  • Alignment
  • Chromatic aberration-eliminated
  • Position
  • Viewing CCD

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