Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

Xingguo Feng; Guangze Tang; Mingren Sun; Xinxin Ma; Liqin Wang

doi:10.1016/j.apsusc.2013.05.001

Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

Xingguo Feng
, Guangze Tang
, Mingren Sun
, Xinxin Ma^*
, Liqin Wang

^*Corresponding author for this work

School of Materials Science and Engineering

Harbin Institute of Technology
School of Mechatronics Engineering, Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

(TaNbTiW)N films with thickness of ∼1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of TaN, NbN, TiNO and TaO are detected in the (TaNbTiW)N films, however both WN and WO are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively.

Original language	English
Pages (from-to)	388-393
Number of pages	6
Journal	Applied Surface Science
Volume	280
DOIs	https://doi.org/10.1016/j.apsusc.2013.05.001
State	Published - 1 Sep 2013

Keywords

(TaNbTiW)N films
Ion implantation
Magnetron sputtering
XPS
XRD

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10.1016/j.apsusc.2013.05.001

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title = "Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII",

abstract = "(TaNbTiW)N films with thickness of ∼1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of TaN, NbN, TiNO and TaO are detected in the (TaNbTiW)N films, however both WN and WO are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively.",

keywords = "(TaNbTiW)N films, Ion implantation, Magnetron sputtering, XPS, XRD",

author = "Xingguo Feng and Guangze Tang and Mingren Sun and Xinxin Ma and Liqin Wang",

year = "2013",

month = sep,

day = "1",

doi = "10.1016/j.apsusc.2013.05.001",

language = "英语",

volume = "280",

pages = "388--393",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

AU - Feng, Xingguo

AU - Tang, Guangze

AU - Sun, Mingren

AU - Ma, Xinxin

AU - Wang, Liqin

PY - 2013/9/1

Y1 - 2013/9/1

N2 - (TaNbTiW)N films with thickness of ∼1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of TaN, NbN, TiNO and TaO are detected in the (TaNbTiW)N films, however both WN and WO are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively.

AB - (TaNbTiW)N films with thickness of ∼1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of TaN, NbN, TiNO and TaO are detected in the (TaNbTiW)N films, however both WN and WO are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively.

KW - (TaNbTiW)N films

KW - Ion implantation

KW - Magnetron sputtering

KW - XPS

KW - XRD

UR - https://www.scopus.com/pages/publications/84879688665

U2 - 10.1016/j.apsusc.2013.05.001

DO - 10.1016/j.apsusc.2013.05.001

M3 - 文章

AN - SCOPUS:84879688665

SN - 0169-4332

VL - 280

SP - 388

EP - 393

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

Abstract

Keywords

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