Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source

Chao Hui Lan; Ji Dong Long; Le Zheng; Pan Dong; Zhen Yang; Tao Wang; Jie Li

doi:10.1088/0256-307X/32/9/095201

Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source

Chao Hui Lan
, Ji Dong Long
, Le Zheng
, Pan Dong
, Zhen Yang
, Tao Wang
, Jie Li

China Academy of Engineering Physics

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process of arc initiation during one shot.

Original language	English
Article number	095201
Journal	Chinese Physics Letters
Volume	32
Issue number	9
DOIs	https://doi.org/10.1088/0256-307X/32/9/095201
State	Published - 1 Sep 2015
Externally published	Yes

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title = "Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source",

abstract = "Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process of arc initiation during one shot.",

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AU - Lan, Chao Hui

AU - Long, Ji Dong

AU - Zheng, Le

AU - Dong, Pan

AU - Yang, Zhen

AU - Wang, Tao

AU - Li, Jie

PY - 2015/9/1

Y1 - 2015/9/1

N2 - Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process of arc initiation during one shot.

AB - Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process of arc initiation during one shot.

UR - https://www.scopus.com/pages/publications/84940840759

U2 - 10.1088/0256-307X/32/9/095201

DO - 10.1088/0256-307X/32/9/095201

M3 - 文章

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VL - 32

JO - Chinese Physics Letters

JF - Chinese Physics Letters

IS - 9

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ER -

Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source

Abstract

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