Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

Xingguo Feng; Guangze Tang; Xinxin Ma; Mingren Sun; Liqin Wang

doi:10.1016/j.nimb.2013.03.001

Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

Xingguo Feng
, Guangze Tang
, Xinxin Ma^*
, Mingren Sun
, Liqin Wang

^*Corresponding author for this work

School of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb-N, ZrO₂, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively.

Original language	English
Pages (from-to)	29-35
Number of pages	7
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	301
DOIs	https://doi.org/10.1016/j.nimb.2013.03.001
State	Published - 2013

Keywords

Hardness
Ion implantation
Magnetron sputtering
Multi-element nitrides
Structure

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10.1016/j.nimb.2013.03.001

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@article{6af8c754e229416bb543f568d77c7a1d,

title = "Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation",

abstract = "Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb-N, ZrO2, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively.",

keywords = "Hardness, Ion implantation, Magnetron sputtering, Multi-element nitrides, Structure",

author = "Xingguo Feng and Guangze Tang and Xinxin Ma and Mingren Sun and Liqin Wang",

year = "2013",

doi = "10.1016/j.nimb.2013.03.001",

language = "英语",

volume = "301",

pages = "29--35",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier B.V.",

}

Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation. / Feng, Xingguo; Tang, Guangze ; Ma, Xinxin et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 301, 2013, p. 29-35.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

AU - Feng, Xingguo

AU - Tang, Guangze

AU - Ma, Xinxin

AU - Sun, Mingren

AU - Wang, Liqin

PY - 2013

Y1 - 2013

N2 - Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb-N, ZrO2, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively.

AB - Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb-N, ZrO2, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively.

KW - Hardness

KW - Ion implantation

KW - Magnetron sputtering

KW - Multi-element nitrides

KW - Structure

UR - https://www.scopus.com/pages/publications/84875743068

U2 - 10.1016/j.nimb.2013.03.001

DO - 10.1016/j.nimb.2013.03.001

M3 - 文章

AN - SCOPUS:84875743068

SN - 0168-583X

VL - 301

SP - 29

EP - 35

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

ER -

Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

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Keywords

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