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Characteristic of capillary discharge soft X-ray laser in Ne-like Ar

  • Y. L. Cheng
  • , X. Q. Zhang
  • , H. G. Gou
  • , Q. S. Zhu
  • , Y. P. Zhao
  • , Y. Xie
  • , Q. Wang
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Ne-like Ar lasers operating at a wavelength of 46.9 nm have been developed by using of a three-coaxial-line Blumlein transmission line (BTL). The discharge system consists of a Marx generator with maximum charging voltage of 300kV, a Blumlein transmission line, as well as a pre-pulse circuit that provide maximum voltage of 20kV. Soft x-ray amplification in Ne-like Ar at 46.9nm with pulse energy of ∼10μJ and duration time of 2ns has been achieved. The plasma columns are pumped by a 20-26kA current pulse with 130ns half-cycle duration in a 3.1mm-diameter and 19cmlength capillary channels filled with pre-ionized Ar gas at pressure of 30-40Pa. The beam profile was observed to have an annular shape and the peak-to-peak divergence is about 4.5 mrad. This new type of short wavelength laser is of interest for numerous applications such as materials ablation and nanopatterning in micro-technology.

Original languageEnglish
Title of host publication3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationDesign, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
DOIs
StatePublished - 2007
Event3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Chengdu, China
Duration: 8 Jul 200712 Jul 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6724
ISSN (Print)0277-786X

Conference

Conference3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Country/TerritoryChina
CityChengdu
Period8/07/0712/07/07

Keywords

  • Capillary discharge
  • EUV source
  • X-ray laser
  • Z-pinch

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