Capillary Z-pinch discharge produced plasma EUV source

Yongpeng Zhao; Qiang Xu; Xingqiang Zhang; Peng Lv; Qi Wang

doi:10.1117/12.823433

Capillary Z-pinch discharge produced plasma EUV source

Yongpeng Zhao^*
, Qiang Xu
, Xingqiang Zhang
, Peng Lv
, Qi Wang

^*Corresponding author for this work

School of Astronautics

Harbin Institute of Technology

Research output: Contribution to journal › Conference article › peer-review

Abstract

Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

Original language	English
Article number	72761J
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7276
DOIs	https://doi.org/10.1117/12.823433
State	Published - 2009
Event	Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications - Wuhan, China Duration: 24 Nov 2008 → 24 Nov 2008

Keywords

DPP
EUV lithography
EUV source
capillary discharge plasma

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10.1117/12.823433

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@article{6d80e9144e664b1ebbf028bce7fb214e,

title = "Capillary Z-pinch discharge produced plasma EUV source",

abstract = "Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).",

keywords = "DPP, EUV lithography, EUV source, capillary discharge plasma",

author = "Yongpeng Zhao and Qiang Xu and Xingqiang Zhang and Peng Lv and Qi Wang",

year = "2009",

doi = "10.1117/12.823433",

language = "英语",

volume = "7276",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications ; Conference date: 24-11-2008 Through 24-11-2008",

}

TY - JOUR

T1 - Capillary Z-pinch discharge produced plasma EUV source

AU - Zhao, Yongpeng

AU - Xu, Qiang

AU - Zhang, Xingqiang

AU - Lv, Peng

AU - Wang, Qi

PY - 2009

Y1 - 2009

N2 - Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

AB - Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

KW - DPP

KW - EUV lithography

KW - EUV source

KW - capillary discharge plasma

UR - https://www.scopus.com/pages/publications/79251619548

U2 - 10.1117/12.823433

DO - 10.1117/12.823433

M3 - 会议文章

AN - SCOPUS:79251619548

SN - 0277-786X

VL - 7276

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 72761J

T2 - Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications

Y2 - 24 November 2008 through 24 November 2008

ER -

Capillary Z-pinch discharge produced plasma EUV source

Abstract

Keywords

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