TY - GEN
T1 - Calibration of a 6-DOF parallel micromanipulator for nanomanipulation
AU - Wang, Lefeng
AU - Rong, Weibin
AU - Feng, Mao
AU - Liu, Taochou
AU - Sun, Lining
PY - 2010
Y1 - 2010
N2 - Nanomanipulation is a key enabling technology for many nanometer scale applications. To realize the full 6-DOF nanomanipulation, parallel micromanipulators have manys advantages comparing to the serial ones. Due to the machining and assembly errors, kinematic calibration is necessary to improve the accuracy further. For the 3-limb 6-dof manipulator in this paper, the error model of it was first developed based on the inverse solutions. The scheme for detecting the positions and poses of the end-effector was also determined. The least square method was used to identify the main parameters of the parallel manipulator, and the identified dimensions were used to control the manipulator. The experiments results verify the effectiveness of the calibration processes.
AB - Nanomanipulation is a key enabling technology for many nanometer scale applications. To realize the full 6-DOF nanomanipulation, parallel micromanipulators have manys advantages comparing to the serial ones. Due to the machining and assembly errors, kinematic calibration is necessary to improve the accuracy further. For the 3-limb 6-dof manipulator in this paper, the error model of it was first developed based on the inverse solutions. The scheme for detecting the positions and poses of the end-effector was also determined. The least square method was used to identify the main parameters of the parallel manipulator, and the identified dimensions were used to control the manipulator. The experiments results verify the effectiveness of the calibration processes.
UR - https://www.scopus.com/pages/publications/77951659487
U2 - 10.1109/INEC.2010.5424582
DO - 10.1109/INEC.2010.5424582
M3 - 会议稿件
AN - SCOPUS:77951659487
SN - 9781424435449
T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
SP - 138
EP - 139
BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010
Y2 - 3 January 2010 through 8 January 2010
ER -