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Brief Review of Nanosilver Sintering: Manufacturing and Reliability

  • Jintao Wang
  • , Si Chen
  • , Luobin Zhang
  • , Xueting Zhao
  • , Fangcheng Duan
  • , Hongtao Chen*
  • *Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

Abstract

In this review, the present status of nanosilver sintering is adapted in detail. This review shows the current scholarly exploration and achievements in this field through the two aspects of manufacturing and reliability. The preparation of nanosilver particles, organic coating and sintering methods, microstructure and failure modules of sintered nanosilver layers are described in detail. Finally, prospects and dilemmas of nanosilver sintering technology as a connection material for semiconductor devices and the directions of future extensions are discussed. Graphic Abstract: [Figure not available: see fulltext.].

Original languageEnglish
Pages (from-to)5483-5498
Number of pages16
JournalJournal of Electronic Materials
Volume50
Issue number10
DOIs
StatePublished - Oct 2021
Externally publishedYes

Keywords

  • 3D integrated packaging
  • Wide band gap semiconductors
  • nanosilver sintering

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