Arc discharge ion plating technology by hot electron emission

Fuzhen Wang; Junwei Wu

doi:10.1016/B978-0-323-90833-7.00006-1

Arc discharge ion plating technology by hot electron emission

Fuzhen Wang
, Junwei Wu

Beijing Union University
Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

Abstract

Arc discharge ion plating technology has higher current density than glow discharge ion plating technology, so that more metal film atoms ionization, improve the metal ionization rate, improve the overall energy of film particles, easy to combine reaction to produce TiN and other compounds hard film. Arc discharge ion plating technology has a gas source of hot electron emission of arc discharge technology, including hollow cathode discharge (HCD) ion plating technology and hot-wire arc discharge ion plating technology, and cold field emission of arc discharge technology, such as cathodic arc ion plating technology. Using these arc discharge ion plating techniques, hard films such as TiN can be deposited on the surface of HSS tool under 500°C. This chapter focuses on the arc discharge ion plating technology by hot electron emission.

Original language	English
Title of host publication	Modern Ion Plating Technology
Subtitle of host publication	Fundamentals and Applications
Publisher	Elsevier
Pages	137-149
Number of pages	13
ISBN (Electronic)	9780323908337
ISBN (Print)	9780323908344
DOIs	https://doi.org/10.1016/B978-0-323-90833-7.00006-1
State	Published - 1 Jan 2023
Externally published	Yes

Keywords

Arc discharge ion plating
arc discharge of gas source
hollow cathode discharge ion plating
hot electron emission
hot-wire arc discharge ion plating

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10.1016/B978-0-323-90833-7.00006-1

Cite this

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abstract = "Arc discharge ion plating technology has higher current density than glow discharge ion plating technology, so that more metal film atoms ionization, improve the metal ionization rate, improve the overall energy of film particles, easy to combine reaction to produce TiN and other compounds hard film. Arc discharge ion plating technology has a gas source of hot electron emission of arc discharge technology, including hollow cathode discharge (HCD) ion plating technology and hot-wire arc discharge ion plating technology, and cold field emission of arc discharge technology, such as cathodic arc ion plating technology. Using these arc discharge ion plating techniques, hard films such as TiN can be deposited on the surface of HSS tool under 500°C. This chapter focuses on the arc discharge ion plating technology by hot electron emission.",

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doi = "10.1016/B978-0-323-90833-7.00006-1",

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AU - Wu, Junwei

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N2 - Arc discharge ion plating technology has higher current density than glow discharge ion plating technology, so that more metal film atoms ionization, improve the metal ionization rate, improve the overall energy of film particles, easy to combine reaction to produce TiN and other compounds hard film. Arc discharge ion plating technology has a gas source of hot electron emission of arc discharge technology, including hollow cathode discharge (HCD) ion plating technology and hot-wire arc discharge ion plating technology, and cold field emission of arc discharge technology, such as cathodic arc ion plating technology. Using these arc discharge ion plating techniques, hard films such as TiN can be deposited on the surface of HSS tool under 500°C. This chapter focuses on the arc discharge ion plating technology by hot electron emission.

AB - Arc discharge ion plating technology has higher current density than glow discharge ion plating technology, so that more metal film atoms ionization, improve the metal ionization rate, improve the overall energy of film particles, easy to combine reaction to produce TiN and other compounds hard film. Arc discharge ion plating technology has a gas source of hot electron emission of arc discharge technology, including hollow cathode discharge (HCD) ion plating technology and hot-wire arc discharge ion plating technology, and cold field emission of arc discharge technology, such as cathodic arc ion plating technology. Using these arc discharge ion plating techniques, hard films such as TiN can be deposited on the surface of HSS tool under 500°C. This chapter focuses on the arc discharge ion plating technology by hot electron emission.

KW - Arc discharge ion plating

KW - arc discharge of gas source

KW - hollow cathode discharge ion plating

KW - hot electron emission

KW - hot-wire arc discharge ion plating

UR - https://www.scopus.com/pages/publications/85150132101

U2 - 10.1016/B978-0-323-90833-7.00006-1

DO - 10.1016/B978-0-323-90833-7.00006-1

M3 - 章节

AN - SCOPUS:85150132101

SN - 9780323908344

SP - 137

EP - 149

BT - Modern Ion Plating Technology

PB - Elsevier

ER -

Arc discharge ion plating technology by hot electron emission

Abstract

Keywords

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