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Analysis of the measured method for scattering properties of high-reflection coating

  • Liu Huasong*
  • , Luo Zheng
  • , Wang Zhanshan
  • , Ji Yiqin
  • , Fan Yongkai
  • , Fan Rongwei
  • *Corresponding author for this work
  • Tongji University
  • Jinhang Institute of Technical Physics
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Integral scattering is one of the important loss components of high-reflection optical thin films, so suppressing integral scattering can enhance the reflectance of high-reflection coating. Using integrating sphere is the important method of the integral scattering measurement of high reflection coatings. The paper introduced the measurement method and apparatus of integral scattering for single-wavelength at incident angle of 45deg by analyzing the principle of integrating sphere. Besides the important error sources and measurement accuracy of the integral scattering were analyzed. High-reflection coating for single wavelength onto fused silica substrate at incident angle of 45deg was manufactured by ion beam sputtering deposition and integral scattering apparatus was used to measure integral scattering of high-reflection coating. Finally by comparison of the experimental result and the value of scattering theory, we achieved the practical measurement errors origin that and established the foundation of scattering loss analysis for the ultra low losses high-reflection coating.

Original languageEnglish
Title of host publicationSeventh International Conference on Thin Film Physics and Applications
DOIs
StatePublished - 2011
Event7th International Conference on Thin Film Physics and Applications - Shanghai, China
Duration: 24 Sep 201027 Sep 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7995
ISSN (Print)0277-786X

Conference

Conference7th International Conference on Thin Film Physics and Applications
Country/TerritoryChina
CityShanghai
Period24/09/1027/09/10

Keywords

  • Diffuse reflection
  • Integral scattering
  • Integrating sphere
  • Measurement error

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