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Alleviating moxifloxacin-induced biological inhibition in ethanol and Cl coexisted wastewater: Why UV/H2O2 is better than Fenton

  • School of Environment, Harbin Institute of Technology
  • Harbin Institute of Technology
  • Chongqing University
  • Shenyang University

Research output: Contribution to journalArticlepeer-review

Abstract

Treating pharmaceutical wastewater containing moxifloxacin or other refractory antibiotics is challenging due to the frequent coexistence of high concentrations of ethanol and chloride ions (Cl), which inhibit oxidative degradation and downstream biological processes. Here, we comparatively evaluated the Fenton, UV/Na2SO3, and UV/H2O2 processes for moxifloxacin removal under certain concentration Cl and ethanol conditions. The results revealed that the removal of moxifloxacin stagnated for Fenton (16.21%) and UV/Na2SO3 (37.72%), while the UV/H2O2 maintained a removal rate of >90%. Mechanistic analysis indicated that although Fenton could remove moxifloxacin in the presence of Cl, its dominant radical was ·Cl2 rather than ·OH, resulting in a lower defluorination rate. Cl and ethanol consumed Fe2+ through reactive species like ·Cl, ·Cl2, and ·HO2, which reduced Fe2+ concentration and blocked the Fenton reaction. In contrast, UV/H2O2 not only sustained direct photolysis but also overcame the reaction inhibition caused by insufficient Fe2+ concentration and maintains continuous ·OH production. And moxifloxacin adsorbed H2O2 than ethanol, Cl, generating ·OH around the moxifloxacin, leading to more effective removal and defluorination (47.30%). Importantly, UV/H2O2 pretreatment restored the nitrification activity of downstream bioprocesses, demonstrating its robustness and practical potential for detoxifying antibiotic-laden wastewater under complex conditions.

Original languageEnglish
Article number165370
JournalChemical Engineering Journal
Volume519
DOIs
StatePublished - 1 Sep 2025
Externally publishedYes

Keywords

  • Ethanol
  • Fenton
  • High-salinity wastewater
  • Moxifloxacin
  • UV/HO
  • UV/NaSO

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