@inproceedings{885fd6dc7bc343f68eb48e32e900f610,
title = "A vertical sidewall surface piezoresistor technology based on DRIE and its typical application in micro xy-stages",
abstract = "A vertical sidewall surface piezoresistor technology is developed for single-wafer-processed MEMS of in-plane lateral piezoresistors configuration. The technology based on the deep reactive ion etching (DRIE) and the ion implantation technology can be used to integrate piezoresistive sensor on the vertical sidewall of trench or beam easily. The developed technology has been successfully applied to a nano-positioning micro xy-stage integrated with displacement sensor based on the piezo-resistance effect, in which the piezoresistor has been fabricated on the vertical sidewall surface of the detecting beam to improve the displacement sensitivity and resolution of sensor. Besides satisfactory electric principles of the piezoresistors obtained, the experimental results also verify the sensitivity of the fabricated piezoresistive sensors is better than 0.903mV/μm without amplification, the linearity is better than 0.814\%, which are well with design.",
keywords = "DRIE, MEMS, Micro xy-stage, Vertical sidewall piezoresistor",
author = "Jiachou Wang and Lining Sun and Weibin Rong and Xinxin Li",
year = "2008",
doi = "10.1007/978-3-540-88518-4\_19",
language = "英语",
isbn = "3540885161",
series = "Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)",
number = "PART 2",
pages = "170--177",
booktitle = "Intelligent Robotics and Applications - First International Conference, ICIRA 2008, Proceedings",
edition = "PART 2",
note = "1st International Conference on Intelligent Robotics and Applications, ICIRA 2008 ; Conference date: 15-10-2008 Through 17-10-2008",
}