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A novel fault detection method for semiconductor manufacturing processes

  • School of Electronics and Information Engineering, Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, we present a novel fault detection method to address online monitoring problem of semiconductor manufacturing processes. To enhance the fault detection efficiency of existing k-nearest neighbor rule (kNN)-based methods, the principal component analysis (PCA) algorithm is employed to implement data dimension reduction and achieve features of high-dimensional data samples. In addition, to raise the fault detection accuracy for batch processes, the improved kNN algorithm based on the Mahalanobis distance is conducted on features of data samples. The proposed method is evaluated by extensive experiments with industrial examples. The experimental results illustrate great improvements on not only efficiency, but also accuracy. In particular, this method has real potential for monitoring semiconductor manufacturing processes reliably and in time.

Original languageEnglish
Title of host publicationI2MTC 2019 - 2019 IEEE International Instrumentation and Measurement Technology Conference, Proceedings
ISBN (Electronic)9781538634608
DOIs
StatePublished - May 2019
Externally publishedYes
Event2019 IEEE International Instrumentation and Measurement Technology Conference, I2MTC 2019 - Auckland, New Zealand
Duration: 20 May 201923 May 2019

Publication series

NameI2MTC 2019 - 2019 IEEE International Instrumentation and Measurement Technology Conference, Proceedings
Volume2019-May

Conference

Conference2019 IEEE International Instrumentation and Measurement Technology Conference, I2MTC 2019
Country/TerritoryNew Zealand
CityAuckland
Period20/05/1923/05/19

Keywords

  • Fault detection
  • K-nearest neighbor rule
  • Mahalanobis distance
  • Principal component analysis
  • Semiconductor manufacturing process

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