Abstract
A method for practical area upscaling of nanopatterning for light-harvesting and photocatalytic applications is presented. Large area electron beam lithography is used to design patterns of simple-shape nanoparticles. After evaporation of gold, ion beam lithography is used to slice nanoparticles with grooves as narrow as 17 ± 3 nm in width for the required spectral performance and light field enhancement. It is demonstrated by systematic numerical simulations that cutting grooves into the Si and SiO 2 substrates up to a ?10 nm depth augments the volume where the light-field enhancement occurs. The dominant component of the field enhancement in the groove is |Ez|2, perpendicular to the substrate's surface. The application potential of 3D-tailored nanoparticles in light harvesting applications is discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 5251-5256 |
| Number of pages | 6 |
| Journal | Journal of Physical Chemistry C |
| Volume | 115 |
| Issue number | 13 |
| DOIs | |
| State | Published - 7 Apr 2011 |
| Externally published | Yes |
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