Abstract
The experimental setup of an extreme ultraviolet (EUV) light source is built. The EUV radiation spectrum with a central wavelength of 13.5 nm from the Xe plasma is obtained and the temporal characteristics are characterized. The multi-peak structure of a light pulse is clarified by the multiple pinch theory. The influence laws of the experimental parameters such as the current amplitude of main pulse, Xe flow rate, inner diameter of ceramic tube, plasma length, and auxiliary gas on EUV radiation intensity are obtained. In addition, a prototype of 13.5 nm EUV light source with a repetition rate of 1 kHz is built and its power supply system, discharge system, debris mitigation tool and collector system are described. The test results about the prototype are also given.
| Translated title of the contribution | 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma |
|---|---|
| Original language | Chinese (Traditional) |
| Article number | 1100001 |
| Journal | Zhongguo Jiguang/Chinese Journal of Lasers |
| Volume | 45 |
| Issue number | 11 |
| DOIs | |
| State | Published - 10 Nov 2018 |
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