高能脉冲磁控溅射技术制备VO2薄膜研究进展

Jinxin Gu; Hang Wei; Feifei Ren; Long Li; Qingpu Fan; Jiupeng Zhao; Shuliang Dou; Yao Li

doi:10.11990/jheu.201911016

高能脉冲磁控溅射技术制备VO₂薄膜研究进展

Translated title of the contribution: Recent progress on the preparation of VO₂ thin films by high-power impulse magnetron sputtering technology

Jinxin Gu
, Hang Wei
, Feifei Ren
, Long Li
, Qingpu Fan
, Jiupeng Zhao
, Shuliang Dou^*
, Yao Li

^*Corresponding author for this work

School of Astronautics

School of Chemistry and Chemical Engineering, Harbin Institute of Technology
Harbin Institute of Technology

Research output: Contribution to journal › Review article › peer-review

1 Scopus citations

Abstract

(HiPIMS) can deposit high-quality thin films under high peak power due to its low duty cycle, low-frequency operation, high peak-power density, and high plasma density. HiPIMS can be used to deposit VO₂ thin films by decreasing the preparation temperature while increasing the density of the thin film. In this paper, the main characteristics of HiPIMS are reviewed. At last, the advantages and problems in preparing VO₂ thin films by HiPIMS were summarized and the application trends were prospected.

Translated title of the contribution	Recent progress on the preparation of VO₂ thin films by high-power impulse magnetron sputtering technology
Original language	Chinese (Traditional)
Pages (from-to)	219-226
Number of pages	8
Journal	Harbin Gongcheng Daxue Xuebao/Journal of Harbin Engineering University
Volume	41
Issue number	2
DOIs	https://doi.org/10.11990/jheu.201911016
State	Published - 5 Feb 2020

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title = "高能脉冲磁控溅射技术制备VO2薄膜研究进展",

abstract = "(HiPIMS) can deposit high-quality thin films under high peak power due to its low duty cycle, low-frequency operation, high peak-power density, and high plasma density. HiPIMS can be used to deposit VO2 thin films by decreasing the preparation temperature while increasing the density of the thin film. In this paper, the main characteristics of HiPIMS are reviewed. At last, the advantages and problems in preparing VO2 thin films by HiPIMS were summarized and the application trends were prospected.",

keywords = "Deposition temperature, Discharge characteristics, High-power impulse magnetron sputtering(HiPIMS), Magnetron sputtering, Phase transition properties, Thermochromic, Transmittance, Vanadium dioxide",

author = "Jinxin Gu and Hang Wei and Feifei Ren and Long Li and Qingpu Fan and Jiupeng Zhao and Shuliang Dou and Yao Li",

year = "2020",

month = feb,

day = "5",

doi = "10.11990/jheu.201911016",

language = "繁体中文",

volume = "41",

pages = "219--226",

journal = "Harbin Gongcheng Daxue Xuebao/Journal of Harbin Engineering University",

issn = "1006-7043",

publisher = "Editorial Board of Journal of Harbin Engineering",

number = "2",

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TY - JOUR

T1 - 高能脉冲磁控溅射技术制备VO2薄膜研究进展

AU - Gu, Jinxin

AU - Wei, Hang

AU - Ren, Feifei

AU - Li, Long

AU - Fan, Qingpu

AU - Zhao, Jiupeng

AU - Dou, Shuliang

AU - Li, Yao

PY - 2020/2/5

Y1 - 2020/2/5

N2 - (HiPIMS) can deposit high-quality thin films under high peak power due to its low duty cycle, low-frequency operation, high peak-power density, and high plasma density. HiPIMS can be used to deposit VO2 thin films by decreasing the preparation temperature while increasing the density of the thin film. In this paper, the main characteristics of HiPIMS are reviewed. At last, the advantages and problems in preparing VO2 thin films by HiPIMS were summarized and the application trends were prospected.

AB - (HiPIMS) can deposit high-quality thin films under high peak power due to its low duty cycle, low-frequency operation, high peak-power density, and high plasma density. HiPIMS can be used to deposit VO2 thin films by decreasing the preparation temperature while increasing the density of the thin film. In this paper, the main characteristics of HiPIMS are reviewed. At last, the advantages and problems in preparing VO2 thin films by HiPIMS were summarized and the application trends were prospected.

KW - Deposition temperature

KW - Discharge characteristics

KW - High-power impulse magnetron sputtering(HiPIMS)

KW - Magnetron sputtering

KW - Phase transition properties

KW - Thermochromic

KW - Transmittance

KW - Vanadium dioxide

UR - https://www.scopus.com/pages/publications/85084943157

U2 - 10.11990/jheu.201911016

DO - 10.11990/jheu.201911016

M3 - 文献综述

AN - SCOPUS:85084943157

SN - 1006-7043

VL - 41

SP - 219

EP - 226

JO - Harbin Gongcheng Daxue Xuebao/Journal of Harbin Engineering University

JF - Harbin Gongcheng Daxue Xuebao/Journal of Harbin Engineering University

IS - 2

ER -

高能脉冲磁控溅射技术制备VO₂薄膜研究进展

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