高引燃脉冲新 HiPIMS 模式对 TiN / CrN 多层膜结构和性能的影响

Multilayer TiN / CrN films can significantly improve the performance and life of components in complex environments. In order to obtain TiN / CrN multifilm with good performance, a new HiPIMS (high-power magnetron sputtering technology) mode with high igniting pulse is proposed. The TiN / CrN multilayer thin films are fabricated by using the new discharge technique in the condition of one to four ignition pulses. The results show that with the increase of ignition pulse number, TiN / CrN film membrane adhesion increase, three binding force under the condition of ignition pulse reach HF1 (indentation method binding force index, HF1 performance good) indentation edge membrane layer is not split, but appear rupture membrane layer under the condition of four pulse ignition membrane adhesion for HF1, and compared with three ignition pulse film rupture also disappear. The adhesion of membrane base is the best. At the same time with the increase of ignition pulse number, the roughness of the membrane layer, narrow grinding crack, hardness increased, the range of hardness is reduced, the film gradually reduce the friction coefficient and friction coefficient is 0.25, under the condition of four pulse ignition membrane layer thickness showed a trend of decrease after the first increase, in three ignition pulse number reaches the maximum under the condition of 332.1 nm. The experimental results show that ignition pulse can strengthen the bonding force between film and matrix, hardness and friction performance, and refine the grain.