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高功率脉冲磁控溅射管内壁沉积 Cr 薄膜结构及性能

Translated title of the contribution: Structure and Properties of Cr Films Deposited by High Power Impulse Magnetron Sputtering on Inner Surface of Tube
  • Houpu Wu
  • , Xiubo Tian*
  • , Linlin Zheng
  • , Chunzhi Gong
  • , Hui Zhang
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Due to the limitation of lumen space, the uniformity and quality of films deposited on inner surface of tube by physical vapor deposition need to be studied and improved. Cr films are deposited by high power impulse magnetron sputtering on the inner surface of 20 # carbon steel tube with diameter of 40 mm and length of 120 mm. And the microstructure and mechanical properties of Cr films deposited at different positions in the tube are studied. The cross-sectional morphology and thickness changes of Cr films are analyzed by SEM. The crystalline phase and the grain size of Cr films are analyzed by XRD. The friction factors of Cr films are evaluated on ball-on-disc wear apparatus. The results show that, with the increase of the depth in the tube, the film thickness with the distance of 15 mm (Position 1), 45 mm (Position 2), 75 mm (Position 3) and 105 mm (Position 4) from the tube orifice is 1 690 nm, 827 nm, 210 nm and 0 nm respectively. With the increase of the depth in the tube, from Position 1 to Position 3, the surface roughness of the Cr films decreases from 12.6 nm to 4.8 nm, the grain size of the Cr films increases from 15 nm to 38nm, and the friction factor of the Cr films increase from 0.68 to 0.89.

Translated title of the contributionStructure and Properties of Cr Films Deposited by High Power Impulse Magnetron Sputtering on Inner Surface of Tube
Original languageChinese (Traditional)
Pages (from-to)210-216
Number of pages7
JournalZhongguo Biaomian Gongcheng/China Surface Engineering
Volume35
Issue number5
DOIs
StatePublished - Oct 2022

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