Abstract
Due to its unique physical and chemical property, diamond is widely used in many fields such as detectors and optoelectronic devices. Many scholars' attention is drew into single crystal diamond because of its potential to significantly increase the functionality of these devices. Presently, single crystal diamonds grown heteroepitaxially on iridium (Ir) substrates reach the largest size and an excellent growth quality. In this paper, substrates with different structures for nucleation and growth processes of epitaxial diamond are introduced. The mechanisms of diamond nucleation by Bias Enhanced Nucleation (BEN) method and growth undergoing an Epitaxial Lateral Overgrowth (ELO) process are described, including technique of Patterned Nucleation and Growth(PNG). Limitations of current study are pointed out, and the future development of heteroepitaxial theory and experiment are also forecasted in this paper.
| Translated title of the contribution | Heteroepitaxial Growth of Single Crystal Diamond Films on Iridium: Procedure and Mechanism |
|---|---|
| Original language | Chinese (Traditional) |
| Pages (from-to) | 909-917 |
| Number of pages | 9 |
| Journal | Wuji Cailiao Xuebao/Journal of Inorganic Materials |
| Volume | 34 |
| Issue number | 9 |
| DOIs | |
| State | Published - 1 Sep 2019 |
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