电-磁场协同增强 HiPIMS 技术的 CrAl 靶放电行为及 CrAlN 薄膜制备

Based on the existing problems of conventional high power impulse magnetron sputtering (HiPIMS), a new HiPIMS discharge mode is developed: electro-magnetic field enhanced high power impulse magnetron sputtering (E-MF) hiPIMS. The discharge behavior of CrAl target and deposition characteristics of CrAlN films in the new discharge mode are studied. The results show that the discharge current waveform of CrAl target varies with the pulse voltage at different working pressures. The peak current of CrAl target pulse increases linearly with the increase of pulse voltage. The peak current of CrAl target pulse increases linearly with the increase of nitrogen flow rate. With the increase of composite DC, the rate of rise of CrAl target current remains unchanged but the peak current of target pulse decreases obviously. Compared with conventional HiPIMS, the surface of CrAlN film prepared by (E-MF) HiPIMS is more smoother and flat, and the surface roughness is only 4.123 nm. The growth structure of CrAlN films is more dense and compact, and the grains are smaller and more uniform. In addition, the friction coefficient of (E-MF) CrAlN thin film samples prepared by HiPIMS technology is significantly reduced, and the wear width is small, only intermittent surface wear occurs at the wear area, and the friction and wear performance is better. At the same time, the corrosion potential and corrosion current of the samples increased greatly, and the corrosion resistance is better.