基于高功率脉冲磁控溅射的 Cr 膜层研究进展

Due to the excellent resistance to high temperature, corrosion and wear, chromium coating (Cr coating) is widely used in the areas of aerospace, weaponry and nuclear power. Since the traditional hard plating technology is environmentally hazardous, an unpolluted and high-performance preparation method of Cr coating is desired. Therefore, the physical vapor deposition technique with environment friend, especially the high power impulsed magnetron sputtering technique with high dissociation rate and bonding characteristic is obtained more focus. This paper introduces the discharge characteristics of the HiPIMS-Cr target and identifies the conditions for obtaining a high Cr dissociation rate during Cr coating deposition. The differences in surface morphology, microstructure and mechanical properties of the Cr coating prepared by the HiPIMS and the traditional technique (e.g., hard chromium plating, DC magnetron deposition sputtering, arc ion plating, etc.) are compared. The effect of different process combinations on the deposition rate of the Cr coating is outlined. Furthermore, the influential factors on the microstructure and performance of HiPIMS-Cr coatings are investigated and the related research progress is discussed. Finally, the future developing in the preparation and application of HiPIMS-Cr coatings is put forward.